Oxford Instruments is invited to visit the Hefei Institute of Chemical Physics, Chinese Academy of Sciences

Invited by Cai Weiping, director of the Institute of Solids Research, Hefei University of Science and Technology, Chinese Academy of Sciences, from July 18th to 22nd, the British Oxford Instruments Plasma Technology (UK) began to visit the Institute of Solid State and made a study. The report titled "Development and Application of Atomic Layer Deposition System (ALD)" was discussed and discussed with the relevant scientific researchers.

As an advanced thin film growth technology, ALD technology has been applied in many fields such as high dielectric and semiconductor thin film growth. New high-dielectric-gate dielectric materials, nanomaterials and nanotechnology, and 3D electronic devices are important driving forces for the development of ALD. Fang Qi's researcher introduced the basic principles, development history, application status, and future development trends of ALD, especially the plasma enhanced ALD technology. Fang Qi's researcher also provided professional suggestions and opinions on the construction and application of ALD labs.